V2O5 xerogel films as interacalation hosts for lithium. I: Insertion stoichiometry, site concentration, and specific energy
In: Journal of the Electrochemical Society, Jg. 142 (1995), Heft 4, S. 1068-1073
academicJournal
- print, 27 ref
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V2O5 xerogel films as interacalation hosts for lithium. I: Insertion stoichiometry, site concentration, and specific energy
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Autor/in / Beteiligte Person: | PARK, H.-K ; SMYRL, W. H ; WARD, M. D |
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Zeitschrift: | Journal of the Electrochemical Society, Jg. 142 (1995), Heft 4, S. 1068-1073 |
Veröffentlichung: | Pennington, NJ: Electrochemical Society, 1995 |
Medientyp: | academicJournal |
Umfang: | print, 27 ref |
ISSN: | 0013-4651 (print) |
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