Spatially resolved Raman spectroscopy of a step graded GexSi1-x strain relief structure
In: Applied physics letters, Jg. 62 (1993), Heft 10, S. 1146-1148
Online
academicJournal
- print, 14 ref
Zugriff:
The structure of a strain relief region between a Si substrate and a low dislocation density Ge film has been measured by Raman spectroscopy. The composition of the structure has been determined with ~1000 Å resolution in the growth direction, and the upper portions shown to be largely relaxed. The presence of microscopic inhomogeneities in these alloys is suggested.
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Spatially resolved Raman spectroscopy of a step graded GexSi1-x strain relief structure
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Autor/in / Beteiligte Person: | TSANG, J. C ; DACOL, F. H ; MOONEY, P. M ; CHU, J. O ; MEYERSON, B. S |
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Zeitschrift: | Applied physics letters, Jg. 62 (1993), Heft 10, S. 1146-1148 |
Veröffentlichung: | Melville, NY: American Institute of Physics, 1993 |
Medientyp: | academicJournal |
Umfang: | print, 14 ref |
ISSN: | 0003-6951 (print) |
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