Interwell coupling effect in Si/SiGe quantum wells grown by ultra high vacuum chemical vapor deposition
In: Nanoscale Research Letters, Jg. 2 (2007), Heft 3, S. 149-154
Online
academicJournal
Zugriff:
AbstractSi/Si0.66Ge0.34coupled quantum well (CQW) structures with different barrier thickness of 40, 4 and 2 nm were grown on Si substrates using an ultra high vacuum chemical vapor deposition (UHV-CVD) system. The samples were characterized using high resolution x-ray diffraction (HRXRD), cross-sectional transmission electron microscopy (XTEM) and photoluminescence (PL) spectroscopy. Blue shift in PL peak energy due to interwell coupling was observed in the CQWs following increase in the Si barrier thickness. The Si/SiGe heterostructure growth process and theoretical band structure model was validated by comparing the energy of the no-phonon peak calculated by the 6 + 2-bandk·pmethod with experimental PL data. Close agreement between theoretical calculations and experimental data was obtained.
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Interwell coupling effect in Si/SiGe quantum wells grown by ultra high vacuum chemical vapor deposition
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| Autor/in / Beteiligte Person: | Ter-Hoe, Loh ; Nguyen Hoai Son ; Balasubramanian, Narayanan ; Rui, Wang ; Yoon Soon Fatt ; Fen, Lu ; Fan Wei Jun ; Liu Chong Yang |
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| Zeitschrift: | Nanoscale Research Letters, Jg. 2 (2007), Heft 3, S. 149-154 |
| Veröffentlichung: | SpringerOpen, 2007 |
| Medientyp: | academicJournal |
| ISSN: | 1931-7573 (print) ; 1556-276X (print) |
| DOI: | 10.1007/s11671-007-9046-8 |
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