Enhanced Cu CMP Process Control by Machine Learning Enabled Measurement on E-Test Macro
In: 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); (2023-05-01) S. 1-3
Konferenz
Zugriff:
Titel: |
Enhanced Cu CMP Process Control by Machine Learning Enabled Measurement on E-Test Macro
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Autor/in / Beteiligte Person: | Timoney, Padraig ; Luke, Joseph ; Rovereto, Mark ; Wyble, Jordan ; Lien, Cheng-Ting ; Alamgir, Zahir ; Ramanathan, Eswar |
Quelle: | 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); (2023-05-01) S. 1-3 |
Veröffentlichung: | 2023 |
Medientyp: | Konferenz |
ISBN: | 978-1-6654-5639-5 (print) |
ISSN: | 2376-6697 (print) |
DOI: | 10.1109/ASMC57536.2023.10121110 |
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