Process Challenges During CVD Oxide Deposition on the Backside of $20-\mu m$ Thin 300-mm Wafers Temporarily Bonded to Glass Carriers
In: IEEE 73rd Electronic Components and Technology Conference (ECTC); (2023-05-01) S. 1584-1589
Konferenz
Zugriff:
Titel: |
Process Challenges During CVD Oxide Deposition on the Backside of $20-\mu m$ Thin 300-mm Wafers Temporarily Bonded to Glass Carriers
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Autor/in / Beteiligte Person: | Kennes, Koen ; Guerrero, Alice ; Salahouelhadj, Abdellah ; Suhard, Samuel ; Derakhshandeh, Jaber ; Phommahaxay, Alain ; Brems, Steven ; Beyer, Gerald ; Beyne, Eric |
Quelle: | IEEE 73rd Electronic Components and Technology Conference (ECTC); (2023-05-01) S. 1584-1589 |
Veröffentlichung: | 2023 |
Medientyp: | Konferenz |
ISBN: | 979-8-3503-3498-2 (print) |
ISSN: | 2377-5726 (print) |
DOI: | 10.1109/ECTC51909.2023.00269 |
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