Technical Difficulties and Optimization Methods of Nmos Share CT IN Contact Hole Etching
In: China Semiconductor Technology International Conference (CSTIC); (2023-06-26) S. 1-3
Konferenz
Zugriff:
Titel: |
Technical Difficulties and Optimization Methods of Nmos Share CT IN Contact Hole Etching
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Autor/in / Beteiligte Person: | Zhu, Peng ; Xu, Renhui ; Fu, Wentao ; Sun, Lei ; Bao, Yu |
Quelle: | China Semiconductor Technology International Conference (CSTIC); (2023-06-26) S. 1-3 |
Veröffentlichung: | 2023 |
Medientyp: | Konferenz |
ISBN: | 979-8-3503-1100-6 (print) ; 979-8-3503-1099-3 (print) |
DOI: | 10.1109/CSTIC58779.2023.10219259 |
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