Hot-wire CVD grown microcrystalline silicon films with and without initial growing layer modification by inductive coupled plasma
In: 30th International Conference on Plasma Science; (2003) S. 229-229
Konferenz
Zugriff:
Titel: |
Hot-wire CVD grown microcrystalline silicon films with and without initial growing layer modification by inductive coupled plasma
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Autor/in / Beteiligte Person: | Kim, D.Y. ; Moon, S.I. ; Seo, C.K. ; Yi, J.S. |
Quelle: | 30th International Conference on Plasma Science; (2003) S. 229-229 |
Veröffentlichung: | 2003 |
Medientyp: | Konferenz |
ISBN: | 0-7803-7911-X (print) ; 978-0-7803-7911-4 (print) |
ISSN: | 0730-9244 (print) |
DOI: | 10.1109/PLASMA.2003.1228734 |
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