CVD tungsten metallization and electron beam lithography for fabricating submicron interconnects for advanced ULSI
In: 1988. Proceedings., Fifth International IEEE VLSI Multilevel Interconnection Conference, 1988, S. 158-164
Konferenz
Zugriff:
Titel: |
CVD tungsten metallization and electron beam lithography for fabricating submicron interconnects for advanced ULSI
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Autor/in / Beteiligte Person: | Wilson, S.R. ; Mattox, R.J. |
Zeitschrift: | 1988. Proceedings., Fifth International IEEE VLSI Multilevel Interconnection Conference, 1988, S. 158-164 |
Quelle: | Fifth International IEEE VLSI Multilevel Interconnection Conference; (1988) S. 158-164 |
Veröffentlichung: | 1988 |
Medientyp: | Konferenz |
DOI: | 10.1109/VMIC.1988.14188 |
Sonstiges: |
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