Trends in advanced process technology—Submicrometer CMOS device design and process requirements
In: Proceedings of the IEEE, Proc. IEEE, Jg. 74 (1986-12-01), Heft 12, S. 1678-1702
Online
academicJournal
Zugriff:
Titel: |
Trends in advanced process technology—Submicrometer CMOS device design and process requirements
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Autor/in / Beteiligte Person: | Brown, D.M. ; Ghezzo, M. ; Pimbley, J.M. |
Link: | |
Zeitschrift: | Proceedings of the IEEE, Proc. IEEE, Jg. 74 (1986-12-01), Heft 12, S. 1678-1702 |
Veröffentlichung: | 1986 |
Medientyp: | academicJournal |
ISSN: | 0018-9219 (print) ; 1558-2256 (print) |
DOI: | 10.1109/PROC.1986.13685 |
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