Fabrication and characteristics of the suppressed sidewall injection magnetotransistor using a CMOS process
In: TRANSDUCERS '05. The 13th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers; Jg. 1 (2005) S. 617-620
Konferenz
Zugriff:
Titel: |
Fabrication and characteristics of the suppressed sidewall injection magnetotransistor using a CMOS process
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Autor/in / Beteiligte Person: | Song, Youn-Gui ; Ryu, Ji-Goo ; Choi, Young-Shig ; Kim, Nam-Ho |
Quelle: | TRANSDUCERS '05. The 13th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers; Jg. 1 (2005) S. 617-620 |
Veröffentlichung: | 2005 |
Medientyp: | Konferenz |
ISBN: | 0-7803-8994-8 (print) ; 978-0-7803-8994-6 (print) |
ISSN: | 2159-547X (print) ; 2164-1641 (print) |
DOI: | 10.1109/SENSOR.2005.1496493 |
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