Effect of deposition temperature on the properties of amorphous carbon thin film deposited using natural precursor by thermal CVD
In: IEEE Symposium on Humanities, Science and Engineering Research (SHUSER); (2012-06-01) S. 695-699
Konferenz
Zugriff:
Titel: |
Effect of deposition temperature on the properties of amorphous carbon thin film deposited using natural precursor by thermal CVD
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Autor/in / Beteiligte Person: | Dayana, K. ; Fadzilah, A. N. ; Rusop, M. |
Quelle: | IEEE Symposium on Humanities, Science and Engineering Research (SHUSER); (2012-06-01) S. 695-699 |
Veröffentlichung: | 2012 |
Medientyp: | Konferenz |
ISBN: | 978-1-4673-1311-7 (print) ; 978-1-4673-1309-4 (print) ; 978-1-4673-1310-0 (print) |
ISSN: | 2378-9808 (print) ; 2378-9816 (print) |
DOI: | 10.1109/SHUSER.2012.6268905 |
Sonstiges: |
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