Position Control and Gas Source CVD Growth Technologies of 2D MX2 Materials for Real LSI Applications
In: IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM); (2018-03-01) S. 331-333
Konferenz
Zugriff:
Titel: |
Position Control and Gas Source CVD Growth Technologies of 2D MX2 Materials for Real LSI Applications
|
---|---|
Autor/in / Beteiligte Person: | Irisawa, T. ; Okada, N. ; Mizubayashi, W. ; Mori, T. ; Chang, W. H. ; Koga, K. ; Ando, A. ; Endo, K. ; Sasaki, S. ; Endo, T. ; Miyata, Y. |
Quelle: | IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM); (2018-03-01) S. 331-333 |
Veröffentlichung: | 2018 |
Medientyp: | Konferenz |
ISBN: | 978-1-5386-3712-8 (print) ; 978-1-5386-3711-1 (print) |
DOI: | 10.1109/EDTM.2018.8421437 |
Sonstiges: |
|