Application of dynamic in-situ ellipsometry and quadrupole mass spectrometry to plasma-assisted etching: Polymer formation and removal
In: Vacuum, Jg. 40 (1990), Heft 6, S. 483-489
academicJournal
Zugriff:
Titel: |
Application of dynamic in-situ ellipsometry and quadrupole mass spectrometry to plasma-assisted etching: Polymer formation and removal
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Autor/in / Beteiligte Person: | Flowers, MC ; Greef, R ; Starbuck, CMK ; Southworth, P ; Thomas, DJ |
Link: | |
Zeitschrift: | Vacuum, Jg. 40 (1990), Heft 6, S. 483-489 |
Veröffentlichung: | 1990 |
Medientyp: | academicJournal |
ISSN: | 0042-207X (electronic) |
DOI: | 10.1016/0042-207X(90)90001-F |
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