CF 4 plasma etching of materials used in microelectronics manufacturing
In: Microelectronics Journal, Jg. 31 (2000), Heft 3, S. 213-215
Online
academicJournal
Zugriff:
Titel: |
CF 4 plasma etching of materials used in microelectronics manufacturing
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Autor/in / Beteiligte Person: | Balachova, O.V ; Alves, M.A.R ; Swart, J.W ; Braga, E.S ; Cescato, L |
Link: | |
Zeitschrift: | Microelectronics Journal, Jg. 31 (2000), Heft 3, S. 213-215 |
Veröffentlichung: | 2000 |
Medientyp: | academicJournal |
ISSN: | 0026-2692 (electronic) |
DOI: | 10.1016/S0026-2692(99)00140-8 |
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