Behaviour of CPW and TFMS lines at high temperature for RF applications in sub-45 nm nodes
In: Microelectronic Engineering, Jg. 87 (2010), Heft 3, S. 324-328
academicJournal
Zugriff:
Titel: |
Behaviour of CPW and TFMS lines at high temperature for RF applications in sub-45 nm nodes
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Autor/in / Beteiligte Person: | Roda Neve, C. ; Farcy, A. ; Gallitre, M. ; Blampey, B. ; Meuris, P. ; Arnaud, L. ; Raskin, J. P. |
Link: | |
Zeitschrift: | Microelectronic Engineering, Jg. 87 (2010), Heft 3, S. 324-328 |
Veröffentlichung: | 2010 |
Medientyp: | academicJournal |
ISSN: | 0167-9317 (electronic) |
DOI: | 10.1016/j.mee.2009.06.021 |
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