Dielectric and leakage characteristics of MTO/STO bilayer films deposited by R.F. magnetron sputtering technique for optical and electronic applications
In: Materials Science & Engineering B, Jg. 282 (2022-08-01)
academicJournal
Zugriff:
Titel: |
Dielectric and leakage characteristics of MTO/STO bilayer films deposited by R.F. magnetron sputtering technique for optical and electronic applications
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Autor/in / Beteiligte Person: | Rabha, Susmita ; Das, Apurba ; Gonne, Sunil ; Mohapatra, Prajna Paramita ; Balmuchu, Shashi Priya ; Radhika, Ethi ; Reddy ; Dobiddi, Pamu |
Link: | |
Zeitschrift: | Materials Science & Engineering B, Jg. 282 (2022-08-01) |
Veröffentlichung: | 2022 |
Medientyp: | academicJournal |
ISSN: | 0921-5107 (electronic) |
DOI: | 10.1016/j.mseb.2022.115790 |
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