Fundamentals of silicon material properties for successful exploitation of strain engineering in modern CMOS manufacturing
In: IEEE Transactions on Electron Devices, Jg. 53 (2006-05-01), Heft 5, S. 944-964
Online
academicJournal
Zugriff:
Titel: |
Fundamentals of silicon material properties for successful exploitation of strain engineering in modern CMOS manufacturing
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Autor/in / Beteiligte Person: | Chidambaran, P.R. ; Bowen, Chris ; Chakravarthi, Srinivasan ; Machala, Charles ; Wise, Rick |
Link: | |
Zeitschrift: | IEEE Transactions on Electron Devices, Jg. 53 (2006-05-01), Heft 5, S. 944-964 |
Veröffentlichung: | 2006 |
Medientyp: | academicJournal |
ISSN: | 0018-9383 (print) |
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