UHV/CVD growth of Si and Si:Ge alloys: chemistry, physics, and device applications
In: Proceedings of the IEEE, Jg. v80 (1992-10-01), Heft n10, S. 1592-1608
Online
academicJournal
Zugriff:
Titel: |
UHV/CVD growth of Si and Si:Ge alloys: chemistry, physics, and device applications
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Autor/in / Beteiligte Person: | Meyerson, Bernard S. |
Link: | |
Zeitschrift: | Proceedings of the IEEE, Jg. v80 (1992-10-01), Heft n10, S. 1592-1608 |
Veröffentlichung: | 1992 |
Medientyp: | academicJournal |
ISSN: | 0018-9219 (print) |
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