Challenges and Performance Limitations of High-k and Oxynitride Dielectrics Materials for Low Power CMOS Applications
In: 華岡工程學報 / Chinese Culture University Hwa Kang Journal of Engineering, Jg. 19 (2005-06-01), S. 135-140
academicJournal
Zugriff:
Titel: |
Challenges and Performance Limitations of High-k and Oxynitride Dielectrics Materials for Low Power CMOS Applications
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Autor/in / Beteiligte Person: | 譚湘瑜(Tan, S. Y.) ; 劉宗慶(Liu, T. C.) |
Link: | |
Zeitschrift: | 華岡工程學報 / Chinese Culture University Hwa Kang Journal of Engineering, Jg. 19 (2005-06-01), S. 135-140 |
Veröffentlichung: | 2005 |
Medientyp: | academicJournal |
ISSN: | 2077-009X (print) |
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