Characterizations of i-a-Si:H and p-a-SiC:H Film using ICP-CVD Method to the Fabrication of Large-area Heterojunction Silicon Solar Cells
In: Transactions on Electrical and Electronic Materials / Transactions on Electrical and Electronic Materials, Jg. 9 (2008-04-25), Heft 2, S. 73-78
academicJournal
Zugriff:
Titel: |
Characterizations of i-a-Si:H and p-a-SiC:H Film using ICP-CVD Method to the Fabrication of Large-area Heterojunction Silicon Solar Cells
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Autor/in / Beteiligte Person: | Chae Hwan Jeonga ; Min Sung Jeon ; Kamisako, Koichi |
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Zeitschrift: | Transactions on Electrical and Electronic Materials / Transactions on Electrical and Electronic Materials, Jg. 9 (2008-04-25), Heft 2, S. 73-78 |
Veröffentlichung: | 2008 |
Medientyp: | academicJournal |
ISSN: | 1229-7607 (print) |
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