5.9 High-Voltage (HV) I/O Gate Oxides with HiK/MG for Advanced SOC (FinFET and FDSOI)
In: Handbook of Thin Film Deposition (4th Edition) 2018; (2018)
Online
E-Book
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5.9 High-Voltage (HV) I/O Gate Oxides with HiK/MG for Advanced SOC (FinFET and FDSOI)
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Autor/in / Beteiligte Person: | Krishna, Seshan ; Dominic, Schepis |
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Quelle: | Handbook of Thin Film Deposition (4th Edition) 2018; (2018) |
Veröffentlichung: | 2018 |
Medientyp: | E-Book |
ISBN: | 978-0-12-812312-6 (print) ; 978-0-12-812311-9 (print) |
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