The Optimal Parameter Setting for Improving the Uniformity of the Electric Characteristic of the CVD Process for Forming the TFT Structure

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The main objective of this study is to improving the uniformity of the electric characteristic of CVD Process, which is the second thin film Process of Array in manufacturing TFT-LCD. The Taguchi method is utilized to clarify the relation between process Parameters and the electric characteristic of TFT and to find out the significant parameters of the CVD process. Then the optimal setting of these significant parameters are determined using Response Surface Method (RSM). Finally, a real case is utilized to verify the effectiveness of the proposed procedure for finding the optimal parameters setting to maximize the yield and enhance the electric characteristic.