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- Nachgewiesen in: USPTO Patent Applications
- Sprachen: English
- Document Number: 20230112024
- Publication Date: April 13, 2023
- Appl. No: 17/907103
- Application Filed: April 23, 2021
- Claim: 1. A composition comprising (A) an acetal functionalized acrylic polymer component comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7): [chemical expression included] wherein PG is an acid cleavable acetal protecting group, wherein said repeat units constitute 100 mole % of the repeat units in said acetal functionalized acrylic polymer, wherein repeat unit of structure (1) ranges from about 10 mole % to about 35 mole % of the acrylic polymer, the repeat unit of structure (2) ranges from about 0 mole % to about 20 mole % of the acrylic polymer, the repeat unit of structure (3) ranges from about 15 mole % to about 55 mole % of the acrylic polymer, the repeat unit of structure (4) ranges from about 0 mole % to about 30 mole % of the acrylic polymer, the repeat unit of structure (5) ranges from about 15 mole % to about 55 mole % of the acrylic polymer, the repeat unit of structure (6) ranges from about 0 mole % to about 40 mole % of the acrylic polymer, the repeat unit of structure (7) ranges from about 0 mole % to about 25 mole % of the acrylic polymer, R1, R2, R3, R4, R5, R6, and R7 are individually selected from either H, F, a C-1 to C-4 perfluoroalkyl, or a C-1 to C-4 alkyl, R8 and R9 are individually selected from H, a C-1 to C-4 alkyl, a C-1 to C-4 alkyloxy alkyl, and a halogen, R10 is selected from the group consisting of a C-1 to C-8 primary alkyl, a C-3 to C-8 secondary alkyl, a C-3 to C-8 cyclic secondary alkyl, and a C-7 to C-14 alicyclic secondary alkyl, R11 is a C-2 to C-8 (hydroxy)alkylene moiety, R12 is a tertiary alkyl acid cleavable group, and further wherein, R13 is a C-3 to C-12, (alkyloxy)alkylene moiety; (B) a tert-alkyl functionalized acrylic polymer component comprising repeat units selected from ones having structure (1a), (2a), (3a), (4a), (5a), (6a), and (7a): [chemical expression included] wherein theses repeat units constitute 100 mole % of the repeat units in said tert-alkyl functionalized acrylic polymer, the repeat unit of structure (1a) ranges from about 0 mole % to about 15 mole % of the acrylic polymer, wherein the repeat unit of structure (2a) ranges from about 0 mole % to about 20 mole % of the acrylic polymer, the repeat unit of structure (3a) ranges from about 0 mole % to about 30 mole % of the acrylic polymer, the repeat unit of structure (4a) ranges from about 0 mole % to about 30 mole % of the acrylic polymer, the repeat unit of structure (5a) ranges from about 15 mole % to about 40 mole % of the acrylic polymer, the repeat unit of structure (6a) ranges from about 30 mole % to about 45 mole % of the acrylic polymer, the repeat unit of structure (7a) ranges from about 0 mole % to about 20 mole % of the acrylic polymer, R1a, R2a, R3a, R4a, Rsa, R6a, and R7a are individually selected from either H, F, a C-1 to C-4 perfluoroalkyl, or a C-1 to C-4 alkyl, R8a and R9a are individually selected from H, a C-1 to C-4 alkyl, a C-1 to C-4 alkyloxy alkyl, and a halogen, R10a is selected from the group consisting of a C-1 to C-8 primary alkyl, a C-3 to C-8 secondary alkyl, a C-3 to C-8 cyclic secondary alkyl, and a C-7 to C-14 secondary alicyclic alkyl, R11a is a C-2 to C-8 (hydroxy)alkylene moiety, R12a is a tertiary alkyl acid cleavable group, and R13a is a C-3 to C-12, (alkyloxy)alkylene moiety; (C) a phenolic resin component comprising a Novolak-based resin; (D) a photo acid generator (PAG) component; and (E) a solvent component, and further wherein, the resist compositions do not include a diazonaphthoquinone (DNQ) component.
- Claim: 2. The composition of claim 1, wherein (A) the acetal functionalized acrylic polymer component comprises from about 15 mole % to about 35 mole % of the repeat unit of structure (1), from about 15 mole % to about 45 mole % of the repeat unit of structure (3), from about 15 mole % to about 35 mole % of the repeat unit of structure (5), from about 10 mole % to about 25 mole % of the repeat unit of structure (7), wherein said repeat units constitute 100 mole % of the repeat units in said acetal functionalized acrylic polymer.
- Claim: 3. (canceled)
- Claim: 4. The composition of claim 1, wherein (A) the acetal functionalized polymer component comprises from about 15 mole % to about 20 mole % of the repeat unit of structure (1), from about 5 mole % to about 25 mole % of the repeat unit of structure (2), from about 15 mole % to about 35 mole % of the repeat unit of structure (5), from about 10 mole % to about 40 mole % of the repeat unit of structure (6), wherein said repeat units constitute 100 mole % of the repeat units in said acetal functionalized acrylic polymer.
- Claim: 5.-9. (canceled)
- Claim: 10. The composition of claim 1, wherein (A) the acetal functionalized acrylic polymer component comprises from about 20 mole % to about 35 mole % of the repeat unit of structure (1), from about 15 mole % to about 50 mole % of the repeat unit of structure (3), from about 15 mole % to about 30 mole % of the repeat unit of structure (5), from about 10 mole % to about 35 mole % of the repeat unit of structure (7), wherein said repeat units constitute 100 mole % of the repeat units in said acetal functionalized acrylic polymer.
- Claim: 11.-17. (canceled)
- Claim: 18. The composition of claim 1, wherein (B) the tert-alkyl functionalized acrylic polymer component comprises from about 2 mole % to about 15 mole % of the repeat unit of structure (1a), from about 10 mole % to about 25 mole % of the repeat unit of structure (3a), from about 15 mole % to about 30 mole % of the repeat unit of structure (5a), from about 30 mole % to about 45 mole % of the repeat unit of structure (6a), from about 2 mole % to about 15 mole % of the repeat unit of structure (7a), wherein said repeat units constitute 100 mole % of the repeat units in said tert-alkyl functionalized acrylic polymer.
- Claim: 19. (canceled)
- Claim: 20. The composition of claim 1, wherein (B) the tert-alkyl functionalized acrylic polymer component comprises from about 2 mole % to about 15 mole % of the repeat unit of structure (1a), from about 10 mole % to about 25 mole % of the repeat unit of structure (3a), from about 10 mole % to about 25 mole % of the repeat unit of structure (4a), from about 25 mole % to about 35 mole % of the repeat unit of structure (5a), from about 30 mole % to about 45 mole % of the repeat unit of structure (6a), wherein said repeat units constitute 100 mole % of the repeat units in said tert-alkyl functionalized acrylic polymer.
- Claim: 21. (canceled)
- Claim: 22. The composition of claim 1, wherein (B) the tert-alkyl functionalized acrylic polymer component from about 5 mole % to about 10 mole % of the repeat unit of structure (1a), from about 10 mole % to about 25 mole % of the repeat unit of structure (3a), from about 25 mole % to about 35 mole % of the repeat unit of structure (5a), from about 35 mole % to about 45 mole % of the repeat unit of structure (6a), wherein said repeat units constitute 100 mole % of the repeat units in said tert-alkyl functionalized acrylic polymer.
- Claim: 23.-25. (canceled)
- Claim: 26. The composition of claim 1, wherein (B) the tert-alkyl functionalized acrylic polymer component comprises from about 10 mole % to about 25 mole % of the repeat unit of structure (3a), from about 25 mole % to about 35 mole % of the repeat unit of structure (5a), from about 30 mole % to about 45 mole % of the repeat unit of structure (6a), from about 8 mole % to about 15 mole % of the repeat unit of structure (7a), wherein said repeat units constitute 100 mole % of the repeat units in said tert-alkyl functionalized acrylic polymer.
- Claim: 27.-31. (canceled)
- Claim: 32. The composition of claim 1, wherein (A) the acetal functionalized polymer component and (B) the tert-alkyl functionalized acrylic polymer component are present in a wt. ratio of (A)/(B) which ranges from about 10 to about 2.3.
- Claim: 33. The composition of claim 1, wherein (A) the acetal functionalized polymer component and (B) the tert-alkyl functionalized acrylic polymer component are present in a wt. ratio of (A)/(B) which ranges from about 9 to about 2.3.
- Claim: 34. The composition of claim 1, wherein (A) the acetal functionalized polymer component and (B) the tert-alkyl functionalized acrylic polymer component are present in a wt. ratio of (A)/(B) which ranges from about 9 to about 3.
- Claim: 35. The composition of claim 1, wherein (A) the acetal functionalized polymer component and (B) the tert-alkyl functionalized acrylic polymer component are present in a wt. ratio of (A)/(B) which ranges from about 8 to about 3.5.
- Claim: 36. The composition of claim 1, wherein (A) the acetal functionalized polymer component and (B) the tert-alkyl functionalized acrylic polymer component are present in a wt. ratio of (A)/(B) which ranges from about 7 to about 4.
- Claim: 37. The composition of claim 14, wherein (C) the Novolak-based resin component comprises repeat unit (I): [chemical expression included] where Ra1, Ra2 and Ra3 are each independently (i) a hydrogen, (ii) an unsubstituted C-1 to C-4 alkyl, (iii) a substituted C-1 to C-4 alkyl, (iv) an unsubstituted —X-Phenol group where X is —O—, —C(CH3)2—, —CH2—, —(C═O)— or —SO2— or (v) an substituted —X-Phenol group where X is —O—, —C(CH3)2—, —CH2—, —(C═O)— or —SO2—.
- Claim: 38.-42. (canceled)
- Claim: 43. The composition of claim 1, wherein the photo acid generator (PAG) component is an aromatic imide N-oxysulfonate derivatives of an organic sulfonic acid, an aromatic sulfonium salt of an organic sulfonic acid, a trihalotriazine derivative or a mixture thereof.
- Claim: 44.-47. (canceled)
- Claim: 48. The composition of claim 1, further comprising one or more optional ingredients selected from among an acid quencher, an auxiliary resin, a thiol, a plasticizer, a surface leveling agent and a stabilizer.
- Claim: 49. The composition of claim 48, wherein the thiol is a heterocyclic thiol.
- Claim: 50. A process of coating a substrate comprising applying the composition of claim 1 on the substrate.
- Claim: 51. A process for imaging a resist comprising the steps; i) coating the composition of claim 1 on a substrate to form a resist film; ii) selectively exposing the resist film to UV light using a mask to form a selectively exposed resist film; iii) developing the selectively exposed film to form a positively imaged resist film over the substrate.
- Claim: 52. A process for imaging a resist comprising the steps; ia) coating the composition of claim 1 on a substrate to form a resist film; iia) selectively exposing the resist film to UV light using a mask to form a selectively exposed resist film; iiia) baking the selectively exposed resist film to form a baked selectively exposed resist film; iva) developing the selectively exposed and baked resist film to form a positively imaged resist film over the substrate.
- Current International Class: 03; 03; 03
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