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A method and apparatus for radio frequency vector calibration of s-parameter measurements to the tips of the wafer probe needles of an automatic test equipment production tester. The method involves a modified Line-Reflect-Line (LRL) calibration routine that uses a Thru-Reflect-Line to LRL shift to eliminate the need for a precisely characterized reflect standard used during a conventional LRL calibration. The method further involves de-embedding the non-ideal effects of the non-zero length thru standard used during the calibration routine to improve measurement accuracy of the tester. The apparatus may involve the use of RF relays to allow multiple wafer probe needles to share RF test ports.

Titel:	LRL vector calibration to the end of the probe needles for non-standard probe cards for ATE RF testers
Autor/in / Beteiligte Person:	Chladek, Steffen ; Breinbauer, Martin
Link:	View record in USPTO Patent Grants (Volltext)
Veröffentlichung:	2009
Medientyp:	Patent
Sonstiges:	Nachgewiesen in: USPTO Patent Grants Sprachen: English Patent Number: 7,532,014 Publication Date: May 12, 2009 Appl. No: 11/463174 Application Filed: August 08, 2006 Assignees: Credence Systems Corporation (Milpitas, CA, US) Claim: 1. A method for radio frequency vector calibration of an automatic test equipment production tester including a plurality of wafer probes, each wafer probe having a plurality of wafer probe needles, each wafer probe needle including a tip, the method comprising: obtaining at least one reflect calibration standard and at least two line calibration standards on-wafer, each of the line calibration standards having an initially unspecified complex propagation constant and each having a different geometric length; measuring a delay value and a loss value of each line calibration standard; determining the complex propagation constant of each line calibration standard; and establishing a reference plane at the tips of the wafer probe needles without precise characterization of the reflect calibration standard. Claim: 2. The method of claim 1 wherein: the line calibration standards comprise a non-zero length thru calibration standard having a middle region and a second line calibration standard; the operation of measuring comprises performing a Thru-Reflect-Line calibration employing the on-wafer calibration standards; and the operation of establishing further comprises: setting the reference plane to the middle region of the first non-zero length thru calibration standard; determining an attenuation constant and a phase constant of the non-zero length thru calibration standard; and shifting the reference plane to the tips of the wafer probe needles based only on knowledge of the geometrical lengths of the line calibration standards used. Claim: 3. The method of claim 2 wherein the operation of shifting further comprises de-embedding the non-zero length thru calibration standard. Claim: 4. The method of claim 2 wherein the non-zero length thru calibration standard is implemented on a wafer using a microstrip. Claim: 5. The method of claim 4 wherein the wafer contains at least one device under test. Claim: 6. The method of claim 2 further comprising: obtaining a spacing between the tips of the wafer probe needles; and wherein the non-zero length thru calibration standard further comprises a microstrip with a length set to the spacing between the tips of the wafer probe needles. Claim: 7. The method of claim 2 wherein the operation of determining further comprises: obtaining a phase difference between the non-zero length thru calibration standard and a the second line calibration standard; obtaining a magnitude difference between the non-zero length thru calibration standard and the second line calibration standard; obtaining a geometrical length difference of the non-zero length thru calibration standard and the second line calibration standard; and wherein the attenuation constant is equal to the magnitude difference divided by the geometric length difference. Claim: 8. A computer readable medium containing computer executable instructions which, when executed, perform the method of claim 1 . Claim: 9. An apparatus for performing calibrated device under test measurements, comprising: an automatic test equipment production tester, comprising: a test head having at least two radio frequency measurement ports; and a load board having a plurality of wafer probes, each wafer probe having a plurality of wafer probe needles, each wafer probe needle having a tip, operably connected to the test head and the device under test; a set of calibration standards that are configured to be accommodated without having to adjust spacing between the wafer probes; wherein the tester is calibrated to the tips of the wafer probe needles using the method of claim 1 . Claim: 10. The method of claim 1 , wherein the method further comprises: providing a first RF relay having a plurality of positions, each of the plurality of positions being configured to couple a first RF measurement port to a corresponding one of the plurality of wafer probe needles included in a first wafer probe. Claim: 11. The method of claim 10 , wherein the method further comprises: providing a second RF relay having a plurality of positions, each of the plurality of positions being configured to couple a second RF measurement port to a corresponding one of the plurality of wafer probe needles included in a second wafer probe. Current U.S. Class: 324/601 Patent References Cited: 5313166 May 1994 Eul et al. ; 5440236 August 1995 Schiek et al. ; 5608330 March 1997 Heuermann et al. ; 5666059 September 1997 Heuermann et al. ; 5861740 January 1999 So ; 7068049 June 2006 Adamian ; 7148702 December 2006 Wong et al. ; 7375534 May 2008 Kamitani Assistant Examiner: Nguyen, Hoai-An D Primary Examiner: Nguyen, Vincent Q

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LRL vector calibration to the end of the probe needles for non-standard probe cards for ATE RF testers