Einzeltreffer — DigiBib

Described herein is a method of processing a pattern layout for a lithographic process, the method comprising: identifying a feature from a plurality of features of the layout, the feature violating a pattern layout requirement; and reconfiguring the feature, wherein the reconfigured feature still violates the pattern layout requirement, the reconfiguring including evaluating a cost function that measures a lithographic metric affected by a change to the feature and a parameter characteristic of relaxation of the pattern layout requirement.

Titel:	Method and apparatus for model based flexible MRC
Autor/in / Beteiligte Person:	ASML NETHERLANDS B.V.
Link:	View record in USPTO Patent Grants (Volltext)
Veröffentlichung:	2016
Medientyp:	Patent
Sonstiges:	Nachgewiesen in: USPTO Patent Grants Sprachen: English Patent Number: 9,418,194 Publication Date: August 16, 2016 Appl. No: 14/456462 Application Filed: August 11, 2014 Assignees: ASML NETHERLANDS B.V. (Veldhoven, NL) Claim: 1. A method of processing an exposure pattern layout for a lithographic process, the method comprising: identifying a first feature from a plurality of features of the layout based, at least in part, on the first feature violating a pattern layout requirement; reconfiguring, by a computer system, a second feature from the plurality of features by performing operations including evaluating a first cost function of a lithographic metric affected by a change to the second feature, until a termination condition is satisfied; and in response to determining that the first feature still violates the pattern layout requirement after the termination condition is satisfied, relaxing the pattern layout requirement by performing operations including evaluating a second cost function of a lithographic metric affected by a parameter characteristic of relaxation of the pattern layout requirement, wherein the first feature no longer violates the pattern layout requirement after the second feature is reconfigured or the pattern layout requirement is relaxed. Claim: 2. The method of claim 1 , wherein the change comprises: movement of a segment of a boundary of the second feature; a change of shape of the second feature; a change of location of the second feature; or a combination thereof. Claim: 3. The method of claim 1 , wherein the second cost function comprises a weighted sum of squares of the lithographic metric and the parameter. Claim: 4. The method of claim 3 , wherein the lithographic metric is one of: resist image intensity, aerial image intensity, edge placement error, resist image difference, aerial image difference and edge placement error difference. Claim: 5. The method of claim 1 , wherein the termination condition includes one or more conditions selected from the group consisting of: minimization of the first cost function; maximization of the first cost function; reaching a preset number of iterations; reaching a value of the first cost function equal to or beyond a preset threshold value; reaching a predefined computation time; and reaching a value of the first cost function within an acceptable error limit. Claim: 6. The method of claim 5 , wherein the first cost function is minimized or maximized by a method selected from a group consisting of: the Gauss-Newton algorithm, the interpolation method, the Levenberg-Marquardt algorithm, the gradient descent algorithm, simulated annealing, interior point method, the genetic algorithm, solving polynomials of the changes to the feature and solving a quadratic programming problem. Claim: 7. The method of claim 1 , further comprising determining based on a criterion whether the first feature and/or the second feature is to be reconfigured. Claim: 8. The method of claim 1 , wherein the parameter constrains an amount of relaxation of the pattern layout requirement. Claim: 9. The method of claim 8 , further comprising outputting a location of the first feature and/or the second feature or an amount of relaxation of the pattern layout requirement. Claim: 10. The method of claim 1 , wherein the second feature is reconfigured and the reconfiguring is performed under a constraint dictating a range of the parameter characteristic of relaxation of the pattern layout requirement. Claim: 11. The method of claim 1 , wherein the reconfiguring is performed under constraints dictating a range of a change to the second feature. Claim: 12. The method of claim 1 , wherein the pattern layout requirement is one or more of the following or a combination thereof: a minimal space rule, a minimal width rule, a minimal space corner-to-corner rule, and a minimal corner-to-edge space rule. Claim: 13. A computer program product comprising a non-transitory computer readable medium having instructions stored thereon, which when executed by a computer system, perform a process of processing an exposure pattern layout for a lithographic process, the process comprising: identifying a first feature from a plurality of features of the layout, the first feature violating a pattern layout requirement; reconfiguring a second feature from the plurality of features by performing operations including evaluating a first cost function of a lithographic metric affected by a change to the second feature, until a termination condition is satisfied; and in response to determining that the first feature still violates the pattern layout requirement after the termination condition is satisfied, relaxing the pattern layout requirement by performing operations including evaluating a second cost function of a lithographic metric affected by a parameter characteristic of relaxation of the pattern layout requirement; wherein the first feature no longer violates the pattern layout requirement after the second feature is reconfigured or the pattern layout requirement is relaxed. Claim: 14. The medium of claim 13 , wherein the change comprises one or more of: movement of a segment of a boundary of the second feature; a change of shape of the second feature; and a change of location of the second feature. Claim: 15. The medium of claim 13 , wherein the second cost function comprises a weighted sum of squares of the lithographic metric and the parameter. Claim: 16. The medium of claim 13 , wherein the termination condition includes one or more conditions selected from the group consisting of: minimization of the first cost function; maximization of the first cost function; reaching a preset number of iterations; reaching a value of the first cost function equal to or beyond a preset threshold value; reaching a predefined computation time; and reaching a value of the first cost function within an acceptable error limit. Patent References Cited: 5535134 July 1996 Cohn ; 6189132 February 2001 Heng ; 6928634 August 2005 Granik et al. ; 7707528 April 2010 White et al. ; 7725845 May 2010 White et al. ; 8336006 December 2012 Kodera et al. ; 8352888 January 2013 Liu et al. ; 8381153 February 2013 Chiang et al. ; 2007/0101303 May 2007 Lien et al. ; 2009/0172626 July 2009 Pucci et al. ; 2009/0187877 July 2009 Vickery, III ; 2009/0217224 August 2009 Wiaux ; 2009/0293037 November 2009 Liu et al. ; 2011/0167394 July 2011 Lippincott ; 2011/0185329 July 2011 Wen et al. ; 2011/0302546 December 2011 Mottaez et al. ; 2013/0000505 January 2013 Tao et al. Primary Examiner: Doan, Nghia Attorney, Agent or Firm: Pillsbury Winthrop Shaw Pittman LLP

Klicken Sie ein Format an und speichern Sie dann die Daten oder geben Sie eine Empfänger-Adresse ein und lassen Sie sich per Email zusenden.

BibTeX Citavi, JabRef, u.a.
(Literaturverwaltung)

PDF kein Volltext!
(Merkzettel, Notizen)

RIS Endnote, Citavi u.a.
(Literaturverwaltung)

MODS
(XML zur Weiterverarbeitung)

oder

Wählen Sie das für Sie passende Zitationsformat und kopieren Sie es dann in die Zwischenablage, lassen es sich per Mail zusenden oder speichern es als PDF-Datei.

Gewünschter Zitations-Stil:

oder

Bitte prüfen Sie, ob die Zitation formal korrekt ist, bevor Sie sie in einer Arbeit verwenden. Benutzen Sie gegebenenfalls den "Exportieren"-Dialog, wenn Sie ein Literaturverwaltungsprogramm verwenden und die Zitat-Angaben selbst formatieren wollen.

Method and apparatus for model based flexible MRC