CVD apparatus
2023
Online
Patent
A preheat ring (126) for use in a chemical vapor deposition system includes a first portion and a second portion selectively coupled to the first portion such that the first and second portions combine to form an opening configured to receive a susceptor therein. Each of the first and second portions is independently moveable with respect to each other.
Titel: |
CVD apparatus
|
---|---|
Autor/in / Beteiligte Person: | GlobalWafers Co., Ltd. |
Link: | |
Veröffentlichung: | 2023 |
Medientyp: | Patent |
Sonstiges: |
|