Advanced titanium nitride (TiN) film as a metal hard mask (MHM) by physical vapor deposition (PVD) for 1X nm node and beyond
In: 한국진공학회 학술발표회초록집 2016-08 2016(8):400-400; Jg. 2016 (2016-08-31) 8, S. 400-400
Konferenz
Zugriff:
Titel: |
Advanced titanium nitride (TiN) film as a metal hard mask (MHM) by physical vapor deposition (PVD) for 1X nm node and beyond
|
---|---|
Autor/in / Beteiligte Person: | Byeong-Hwa, JEONG ; Eun-Kyoung, MA ; Chang-Min, JEONG ; Jouji, HIROISHI ; Shin, KIM ; Hyun-Ji, CHO ; Min-Soo, KIM ; Yong-Seok, JANG ; Seung-Su, CHOI ; In Sang, JEON |
Link: | |
Quelle: | 한국진공학회 학술발표회초록집 2016-08 2016(8):400-400; Jg. 2016 (2016-08-31) 8, S. 400-400 |
Veröffentlichung: | 2016 |
Medientyp: | Konferenz |
Sonstiges: |
|