Formation of Ultra-Shallow Junctions by Advanced Plasma Doping Techniques
2011
Online
academicJournal
Titel: |
Formation of Ultra-Shallow Junctions by Advanced Plasma Doping Techniques
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Autor/in / Beteiligte Person: | Ito, H [Varian Semiconductor Equipment Associates, 35 Dory Road, Gloucester, MA, 01930 (United States)] |
Link: | |
Veröffentlichung: | 2011 |
Medientyp: | academicJournal |
ISSN: | 0094-243X (print) |
DOI: | 10.1063/1.3548332 |
Sonstiges: |
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